Chinalcometal

High Purity Titanium ingot Round Bar 3N-5N5

High-purity titanium ingots (3N–5N5) are produced through advanced refining and melting processes designed to achieve extremely low levels of metallic and non-metallic impurities. Typical production routes include multiple stages of vacuum melting such as Vacuum Arc Remelting (VAR) or Electron Beam Cold Hearth Melting (EBCHM), which effectively remove volatile elements and inclusions while ensuring compositional uniformity. Strict process control and repeated purification cycles are required to reach semiconductor-grade purity levels ranging from 99.9% to 99.9995%.

We provide 3N–5N5 titanium ingot round bars, manufactured under controlled melting conditions to ensure exceptional purity, stability, and consistency for high-end industrial applications.

Size of High Purity Titanium Ingot

Size :

Min.15mm, Max Diameter 800mm ;

Weight :

Max 1500kgs;

MOQ :

100kgs

Package :

Export wooden pallet

Usage:

Semiconductor industrial

 Composition of High Purity Titanium Ingot 

Desp.

3N

3N5

4N

4N5

5N

5N5

% [wt]

Test M.

Ti

≥99.9

≥99.95

≥99.99

≥99.995

≥99.999

≥99.9995

Ag

-

-

1

0.5

0.01

0.01

ppm [wt]

GDMS

Al

-

50

10

3

2

2

ppm [wt]

GDMS

As

-

-

10

1

0.5

0.5

ppm [wt]

GDMS

Au

-

-

1

0.5

0.25

0.25

ppm [wt]

GDMS

B

-

1

-

0.1

0.05

0.05

ppm [wt]

GDMS

Be

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Bi

-

-

-

0.1

0.05

0.05

ppm [wt]

GDMS

Ca

-

-

1

1

0.5

0.5

ppm [wt]

GDMS

Cd

-

-

-

1

0.2

0.2

ppm [wt]

GDMS

Cl

600

10

5

1

0.1

0.1

ppm [wt]

GDMS

Co

-

-

5

1

0.05

0.05

ppm [wt]

GDMS

Cr

-

20

5

1

0.8

0.8

ppm [wt]

GDMS

Cu

-

50

5

2

1

1

ppm [wt]

GDMS

F

-

-

-

15

0.5

0.5

ppm [wt]

GDMS

Fe

700

200

10

7

5

3

ppm [wt]

GDMS

Hg

-

-

-

0.5

0.5

0.1

ppm [wt]

GDMS

K

-

0.1

0.1

0.05

0.05

0.01

ppm [wt]

GDMS

Li

-

0.1

0.1

0.05

0.05

0.005

ppm [wt]

GDMS

Mg

-

1

2

1

0.1

0.1

ppm [wt]

GDMS

Mn

-

10

5

1

1

0.5

ppm [wt]

GDMS

Mo

-

-

4

1

0.05

0.05

ppm [wt]

GDMS

Na

-

-

0.2

0.03

0.03

0.03

ppm [wt]

GDMS

Ni

250

25

5

1

0.5

0.5

ppm [wt]

GDMS

P

-

-

-

1

0.25

0.01

ppm [wt]

GDMS

Pb

-

-

-

1

0.1

0.01

ppm [wt]

GDMS

Pd

-

-

-

0.1

0.1

0.01

ppm [wt]

GDMS

S

-

-

10

10

5

3

ppm [wt]

GDMS

Sb

-

-

7

0.5

0.5

0.05

ppm [wt]

GDMS

Si

200

50

5

2

1

1

ppm [wt]

GDMS

Sn

-

-

5

1

0.5

0.01

ppm [wt]

GDMS

Te

-

-

-

0.5

0.5

0.05

ppm [wt]

GDMS

Th

-

0.001

0.001

0.0005

0.0001

0.0001

ppm [wt]

GDMS

U

-

0.001

0.001

0.0005

0.0001

0.0001

ppm [wt]

GDMS

V

-

-

-

1

1

1

ppm [wt]

GDMS

W

-

-

-

1

0.1

0.1

ppm [wt]

GDMS

Zn

-

-

5

1

0.1

0.1

ppm [wt]

GDMS

Zr

-

-

5

3

1

1

ppm [wt]

GDMS

Ba

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Br

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Ce

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Cs

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Ga

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Ge

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Hf

-

-

-

1

1

1

ppm [wt]

GDMS

I

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

In

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

La

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Pt

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Re

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Rh

-

-

-

0.2

0.2

0.2

ppm [wt]

GDMS

Ru

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Sc

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Se

-

-

-

0.5

0.5

0.5

ppm [wt]

GDMS

Pr

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Nd

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Sm

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Eu

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Gd

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Tb

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Dy

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Ho

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Er

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Tm

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Yb

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Lu

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Os

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Ir

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Pt

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

Tl

-

-

-

0.1

0.1

0.1

ppm [wt]

GDMS

C

200

150

50

30

30

30

ppm [wt]

LECO

H

50

10

5

10

6

6

ppm [wt]

LECO

N

200

100

50

30

30

30

ppm [wt]

LECO

O

800

700

450

300

200

100

ppm [wt]

LECO

High Purity Titanium Ingot Applications

Due to their high purity and excellent surface quality, high-purity titanium bars are widely used in semiconductor manufacturing equipment and precision engineering components. They are commonly applied in the fabrication of vacuum chambers, sputtering targets, and other critical parts used in processes such as chemical vapor deposition (CVD) and thin-film deposition. Their good machinability further supports the production of complex, high-precision structures. Moreover, their recyclability and environmentally friendly characteristics align with the sustainability requirements of modern advanced semiconductor manufacturing.


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